Browsing by author "Hatakeyama, Shinichi"
Now showing items 1-10 of 10
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A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
Advances and challenges in dual-tone development process optimization
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Printz, Wallace; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Niwa, Takafumi; Bernard, Sophie; Gronheid, Roel (2009) -
Advances in process optimization for dual-tone development as a double patterning technique
Fonseca, Carlos; Somervell, Mark; Bernard, Sophie; Hatakeyama, Shinichi; Nafus, Kathleen; Leeson, Michael; Scheer, Steven; Gronheid, Roel (2008) -
Effect of PAG distribution on ArF and EUV resist performance
Gronheid, Roel; Rathsack, Benjamin; Bernard, Sophie; Vaglio Pret, Alessandro; Nafus, Kathleen; Hatakeyama, Shinichi (2009) -
Feasibility study on dual tone development for frequency doubling
Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Weichert, Heiko; Nafus, Kathleen; Hatakeyama, Shinichi; Kitano, J.; Kosugi, H.; Yoshihara, K.; Goethals, Mieke; Hermans, Jan (2009) -
LWR reduction by novel lithographic and etch techniques
Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi (2010) -
Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Rathsack, Benjamin; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Understanding and improving double patterning CDU through Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Kubo, Akihiro; Kondo, Yoshihiro; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Leray, Philippe; Cheng, Shaunee (2008)