Browsing by author "Lee, Hean-Cheal"
Now showing items 1-7 of 7
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A study of gate oxide damage due to the plasma etching process on sub-0.25μm technology
Lee, Hean-Cheal (1999-12) -
Comparative study of porous SOG films with different non-destructive instrumentation
Baklanov, Mikhaïl; Kondoh, Eiichi; Linskens, Frank; Gidley, D. W.; Lee, Hean-Cheal; Mogilnikov, K. P.; Sune, Jorge (2001) -
Plasma process induced physical damage on ultra thin gate oxide
Lee, Hean-Cheal; Vanhaelemeersch, Serge (1998) -
Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
Lee, Hean-Cheal; Creusen, Martin; Groeseneken, Guido; Vanhaelemeersch, Serge (1998) -
The effect of plasma damage and different annealing ambients on the generation of latent interface states
Creusen, Martin; Lee, Hean-Cheal; Vanhaelemeersch, Serge; Groeseneken, Guido (1998) -
The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers
Vanhaelemeersch, Serge; Van den hove, Luc; Lee, Hean-Cheal (1997) -
The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers
Lee, Hean-Cheal; Vanhaelemeersch, Serge (1998)