Browsing by author "Kozawa, Takahiro"
Now showing items 1-6 of 6
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Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking
Naqvi, Bilal; Enomoto, Satoshi; Machida, Kohei; Takata, Yui; Kozawa, Takahiro; Muroya, Yusa; De Gendt, Stefan; De Simone, Danilo (2024) -
Reaction Mechanisms and EB Patterning Evaluation of Sn-complex-side-chain Polymer Used for EUV Lithography
Takata, Yui; Muroya, Yusa; Kozawa, Takahiro; Enomoto, Satoshi; Naqvi, Bilal; De Simone, Danilo (2023) -
Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis
Takata, Yui; Muroya, Yusa; Kozawa, Takahiro; Machida, Kohei; Enomoto, Satoshi; Naqvi, Bilal; De Simone, Danilo (2023) -
Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Yamamoto, Hiroki; Vesters, Yannick; Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert; Kozawa, Takahiro (2019-01) -
Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2018) -
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2019-12)