Browsing by author "Gogolides, E."
Now showing items 1-5 of 5
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Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
Constantoudis, V.; Patsis, G.P.; Leunissen, Peter; Gogolides, E. (2004-08) -
Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Gogolides, E.; Baik, Ki-Ho; Yannakopolou, K.; Van den hove, Luc (1994) -
Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
Patsis, G.P.; Constantoudis, V.; Tserepi, A.; Gogolides, E.; Grozev, Grozdan (2003) -
Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
Patsis, G.P.; Constantoudis, V.; Tserepi, A.; Gogolides, E.; Grozev, Grozdan; Hoffmann, Thomas (2003) -
Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
Drygianakis, D.; Nijkerk, M.D.; Patsis, G.P.; Kokkoris, G.; Raptis, I.; Leunissen, Peter; Gogolides, E. (2007)