Browsing by author "Colombeau, B."
Now showing items 1-5 of 5
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Current understanding and modeling of B diffusion and activation anomalies in preamporphized ultra-shallow junctions
Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Cristiano, F.; Claverie, A.; Duffy, Ray; Pawlak, Bartek; Ortiz, C.J.; Pichler, P.; Lampin, E.; Zechner, C. (2004) -
Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate
Pawlak, Bartek; Duffy, Ray; Janssens, Tom; Vandervorst, Wilfried; Severi, Simone; Richard, Olivier; Benedetti, Alessandro; Eyben, Pierre; Colombeau, B.; Cowern, N.E.B.; Camillo-Castillo, R.A.; Jones, K.S.; Aboy, M. (2005) -
Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth
Pawlak, Bartek; Vandervorst, Wilfried; Smith, A.J.; Cowern, Nick E.B.; Colombeau, B.; Pagès, Xavier (2005) -
Evidence on the mechanism of boron deactivation in Ge-preamorphized ultrashallow junctions
Pawlak, Bartek; Surdeanu, Radu; Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Lindsay, Richard; Vandervorst, Wilfried; Brijs, Bert; Richard, Olivier; Cristiano, F. (2004) -
Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
Togo, Mitsuhiro; Sasaki, Yuichiro; Zschaetzsch, Gerd; Boccardi, Guillaume; Ritzenthaler, Romain; Lee, Jae Woo; Khaja, F.; Colombeau, B.; Godet, L.; Martin, P.; Brus, Stephan; Altamirano Sanchez, Efrain; Mannaert, Geert; Dekkers, Harold; Hellings, Geert; Horiguchi, Naoto; Vandervorst, Wilfried; Thean, Aaron (2013)