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Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
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Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Togo, Mitsuhiro
;
Sasaki, Yuichiro
;
Zschaetzsch, Gerd
;
Boccardi, Guillaume
;
Ritzenthaler, Romain
;
Lee, Jae Woo
;
Khaja, F.
;
Colombeau, B.
;
Godet, L.
;
Martin, P.
;
Brus, Stephan
;
Altamirano Sanchez, Efrain
;
Mannaert, Geert
;
Dekkers, Harold
;
Hellings, Geert
;
Horiguchi, Naoto
;
Vandervorst, Wilfried
;
Thean, Aaron
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1968
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
1968
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-10
Citations