Publication:
Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
Date
| dc.contributor.author | Togo, Mitsuhiro | |
| dc.contributor.author | Sasaki, Yuichiro | |
| dc.contributor.author | Zschaetzsch, Gerd | |
| dc.contributor.author | Boccardi, Guillaume | |
| dc.contributor.author | Ritzenthaler, Romain | |
| dc.contributor.author | Lee, Jae Woo | |
| dc.contributor.author | Khaja, F. | |
| dc.contributor.author | Colombeau, B. | |
| dc.contributor.author | Godet, L. | |
| dc.contributor.author | Martin, P. | |
| dc.contributor.author | Brus, Stephan | |
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | Mannaert, Geert | |
| dc.contributor.author | Dekkers, Harold | |
| dc.contributor.author | Hellings, Geert | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Thean, Aaron | |
| dc.contributor.imecauthor | Boccardi, Guillaume | |
| dc.contributor.imecauthor | Ritzenthaler, Romain | |
| dc.contributor.imecauthor | Brus, Stephan | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Mannaert, Geert | |
| dc.contributor.imecauthor | Dekkers, Harold | |
| dc.contributor.imecauthor | Hellings, Geert | |
| dc.contributor.imecauthor | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.contributor.imecauthor | Thean, Aaron | |
| dc.contributor.orcidimec | Boccardi, Guillaume::0000-0003-3226-4572 | |
| dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
| dc.contributor.orcidimec | Dekkers, Harold::0000-0003-4778-5709 | |
| dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.date.accessioned | 2021-10-21T12:45:20Z | |
| dc.date.available | 2021-10-21T12:45:20Z | |
| dc.date.issued | 2013 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23171 | |
| dc.identifier.url | http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6576650 | |
| dc.source.beginpage | T196 | |
| dc.source.conference | Symposium on VLSI Technology | |
| dc.source.conferencedate | 11/06/2013 | |
| dc.source.conferencelocation | Kyoto Japan | |
| dc.source.endpage | T197 | |
| dc.title | Heated implantation with amorphous carbon CMOS mask for scaled FinFETs | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |