Browsing by author "Do, Thuy"
Now showing items 1-5 of 5
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Contour-based self-aligning calibration of OPC models
Kusnadi, Ir; Do, Thuy; Granik, Yuri; Sturtevant, John L.; De Bisschop, Peter; Hibino, Daisuke (2010) -
Contour-quality assessment for OPC model calibration
Filitchkin, Paul; Do, Thuy; Kusnadi, Ir; Sturtevant, John; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2011-02) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009)