Browsing by author "Chen, Shiuh-Bin"
Now showing items 1-4 of 4
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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Vladimir; Jonckheere, Rik; Philipsen, Vicky; Schätz, Thomas; Sommer, Karl (2002) -
Implementation of 248nm based CD metrology for advanced reticle production
Hourd, Andrew; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Doebereiner, Stefan; Hillman, Frank; Brueck, Hans-Juergen; Hartmann, Hans; Ordynskyy, Volodymyr; Peter, Kai; Chen, Shiuh-Bin; Chen, Parkson; Jonckheere, Rik; Philipsen, Vicky; Schaetz, Thomas; Sommer, Karl (2003-01) -
Reliable sub-nanometer repeatability for CD metrology in a reticle production environment
Hourd, Andrew; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Döbereiner, Stefan; Hillmann, Frank; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson; Jonckheere, Rik; Philipsen, Vicky; Hartmann, Hans; Ordynskyy, Vladimir; Peter, Kai; Schätz, Thomas; Sommer, Karl (2002-12) -
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Jonckheere, Rik; Philipsen, Vicky; Scheuring, Gerd; Hillman, Frank; Brueck, Hans-Juergen; Ordynskyy, Volodymyr; Peter, Kai; Hourd, Andrew; Schaetz, Thomas; Chen, Shiuh-Bin; Chen, Parkson; Sommer, Karl (2003-01)