Browsing by author "Davies, G."
Now showing items 1-7 of 7
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193 nm lithography on a full field scanner
Goethals, Mieke; Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999) -
Advanced 193 nm step and scan technology
Stoeldraijer, J.; Mulkens, J.; Davies, G.; Sytsma, J.; Bakker, H.; Glatzel, H.; Wagner, C.; Roempp, O.; Boerret, R.; Goethals, Mieke (1998) -
ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
Mulkens, J.; Stoeldraijer, J.; Davies, G.; Dierichs, M.; Heskamp, B.; Moers, M. H.; George, R. A.; Roempp, O.; Glatzel, H.; Wagner, C.; Pollers, Ingrid; Jaenen, Patrick (1999) -
Introducing 193 nm lithography
Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998) -
Lithographic performance of 193 nm resist
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Heskamp, B.; Davies, G.; Gehoel-van Ansem, W.; Paniez, P.; Temerson, T. M.; Hien, S.; Mortini, B.; Romeo, C. (1998) -
Recent advancements in 193 nm step and scan lithography
Goethals, Mieke; Jaenen, Patrick; Pollers, Ingrid; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999) -
Status of ArF lithography for the 130nm technology node
Ronse, Kurt; Vandenberghe, Geert; Jaenen, Patrick; Delvaux, Christie; Vangoidsenhoven, Diziana; Van Roey, Frieda; Pollers, Ingrid; Maenhoudt, Mireille; Goethals, Mieke; Pollentier, Ivan; Vleeming, Bert; van Ingen Schenau, K.; Heskamp, B.; Davies, G.; Finders, Jo; Niroomand, Ardavan (2000)