Browsing by author "Torres, Andres"
Now showing items 1-6 of 6
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Complementary dipole exposure solutions at 0.29k1
Hendrickx, Eric; Torres, Andres; Lafferty, Neal; Le Cam, Laurent; Johnson, Stephen; Reita, Carlo; Vandenberghe, Geert; Maurer, Wilhelm (2005) -
Defect printability for 100-nm design rule using 193nm lithography
Philipsen, Vicky; Jonckheere, Rik; Kohlpoth, Stephanie; Torres, Andres (2002) -
Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp
Tritchkov, Alex; Glotov, Petr; Komirenko, Sergey; Sahouria, Emile; Torres, Andres; Seoud, Ahmed; Wiaux, Vincent (2008) -
Physically-based compact models for fast lithography simulation
Lafferty, Neal; Adam, Kostas; Granik, Yuri; Torres, Andres; Maurer, Wilhelm (2005) -
Source polarization and OPC effects on illumination optimization
Brist, Travis; Bailey, George E.; Drozdov, Alexander; Torres, Andres; Estroff, Andrew; Hendrickx, Eric (2005) -
Validation of improved compact model in grapho-epitaxy Directed-Self-Assembly (DSA)
Fenger, Germain; Bekaert, Joost; Torres, Andres; Granik, Yuri; Krasnova, Polina; Doise, Jan; Boeckx, Carolien; Vandenberghe, Geert; Gronheid, Roel (2015)