Browsing by author "Wong, Alfred"
Now showing items 1-5 of 5
-
Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O. (1995) -
Massively parallel electromagnetic simulation for photolithographic applications
Wong, Alfred; Guerrieri, R.; Neureuther, A. R. (1995) -
Optical proximity correction for 0.3 μm i-line lithography
Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc (1996) -
Optical proximity correction: mask pattern-generation challenges
Jonckheere, Rik; Wong, Alfred; Yen, Anthony; Ronse, Kurt; Van den hove, Luc (1996) -
Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
Wong, Alfred; Neureuther, A. R. (1995)