Browsing by author "Rochat, N."
Now showing items 1-5 of 5
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Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
Cosnier, Vincent; Bender, Hugo; Caymax, Matty; Chen, Jian; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Tsai, Wilman; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Rochat, N.; Olivier, M.; Chabli, A. (2001) -
Integration issues in step and repeat UV nanoimprint lithography
Charpin-Nicolle, C.; Chiaroni, J.; Le Cunff, Y.; Denis, H.; Rochat, N.; Villani, M. L.; Massin, J.; Irmscher, M.; Vratzov, B.; van Hossen, H.; Gubbini, P.; Lorusso, Gian; Van Den Heuvel, Dieter (2008) -
Physical characterization of mixed HfAlOx layers by complementary analysis techniques
Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, E.; Houssiau, L.; Pireaux, J-J.; Bergmaier, A.; Dollinger, G. (2004) -
Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, R.; Houssiau, L.; Pireaux, J.J.; Bergmaier, A.; Dollinger, G. (2003) -
Use of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration
Beynet, Julien; De Roest, David; Rochat, N.; Kellens, Kristof; Verdonck, Patrick; Sprey, Hessel (2009)