Browsing by author "Bret, Tristan"
Now showing items 1-14 of 14
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Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Analysis of EUV mask multilayer defect printing characteristics
Erdmann, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2012) -
Comparison between existing inspection techniques for EUV mask defects
Van Den Heuvel, Dieter; Jonckheere, Rik; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt; Abe, Tsukasa; Magana, John; Bret, Tristan (2010) -
Ebeam based mask repair as door opener for defect free EUV masks
Waiblinger, Markus; Bret, Tristan; Jonckheere, Rik; Van Den Heuvel, Dieter (2012) -
EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Bret, Tristan; Baralia, Gabriel; Baur, Christof; Budach, Michael; Hofmann, Thorsten; Edinger, Klaus; Magana, John; Jonckheere, Rik; Van Den Heuvel, Dieter (2011) -
Evidence of printing blank-related defects on EUV masks missed by blank inspection
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Mask defects in EUV lithography: Understanding
Erdman, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2012) -
Modeling strategies for EUV mask multilayer defect dispositioning
Erdman, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2013) -
Natural EUV mask blank defects: evidence, timely detection, analysis and outlook
Van Den Heuvel, Dieter; Jonckheere, Rik; Magana, John; Abe, Tsukasa; Bret, Tristan; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt (2010) -
Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Erdmann, Andreas; Shao, Feng; Evanschitzky, Peter; Fuehner, Tim; Lorusso, Gian; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Bret, Tristan; Hofmann, Thorsten (2011) -
Repair of natural EUV reticle defects
Jonckheere, Rik; Bret, Tristan; Van Den Heuvel, Dieter; Magana, John F.; Gao, Weimin; Waiblinger, Markus (2011) -
Rigorous modeling and optimization
Erdman, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2012) -
Study of multilayer defects on sub-32nm HP EUV reticles
Van Den Heuvel, Dieter; Jonckheere, Rik; Bret, Tristan; Waiblinger, Markus (2012) -
The door opener for EUV mask repair
Waiblinger, Markus; Jonckheere, Rik; Bret, Tristan; Van Den Heuvel, Dieter; Baur, C; Baralia, G (2012)