Browsing by author "Pétry, Jasmine"
Now showing items 1-7 of 7
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Characterisation of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2002) -
Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2001) -
Gate dielectrics for high performance and low power CMOS SoC applications
Cubaynes, Florence; Dachs, Charles; Detcheverry, Celine; Zegers, A.; Venezia, Vincent; Schmitz, Jurriaan; Stolk, Peter; Jurczak, Gosia; Henson, Kirklen; Degraeve, Robin; Rothschild, Aude; Conard, Thierry; Pétry, Jasmine; Da Rold, Martina; Schaekers, Marc; Badenes, Gonçal; Date, L.; Pique, D.; Al-Shareef, H.; Murto, R. (2002) -
Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Nohira, Hiroshi; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Pétry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jos; Tuominen, Marko (2001) -
Physical characterization of high-k gate stacks deposited on HF-last surfaces
Bender, Hugo; Conard, Thierry; Nohira, Hiroshi; Pétry, Jasmine; Richard, Olivier; Zhao, Chao; Brijs, Bert; Besling, Wim; Detavernier, C.; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Chen, Jian; Kluth, Jon; Tsai, Wilman; Maes, Jos (2001) -
Thermal stability and scalability of zr-aluminate-based high-k gate stacks
Chen, Jerry; Cartier, Eduard; Carter, Richard; Kauerauf, Thomas; Zhao, Chao; Pétry, Jasmine; Cosnier, Vincent; Xu, Zhen; Kerber, Andreas; Tsai, Wilman; Young, Edward; Kubicek, Stefan; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Copel, M.; Besling, Wim; Bajolet, Philippe; Maes, Jan (2002) -
TOFSIMS as a monitor for thin film growth
Conard, Thierry; Vandervorst, Wilfried; Pétry, Jasmine; Zhao, Chao; Besling, Wim; Nohira, Hiroshi; Richard, Olivier (2001)