Browsing by author "Athimulam, Raja"

Double patterning with dual hard mask for 28nm node devices and below

Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013)

Double patterning with dual hard mask for 28nm node devices and below

Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013)

Fluorocarbon-based passivation in STI plasma etching

Milenin, Alexey; Athimulam, Raja; Demand, Marc; Coenegrachts, Bart (2012)

Poly-open and metal CMP steps in RMG processing on planar and 3D architecture devices

Devriendt, Katia; Kellens, Kristof; Veloso, Anabela; Athimulam, Raja; Horiguchi, Naoto; Leunissen, Peter (2011)

Standard cell level parasitics assessment in 20nm BPL and 14nm BFF

Schuddinck, Pieter; Badaroglu, Mustafa; Stucchi, Michele; Demuynck, Steven; Hikavyy, Andriy; Garcia Bardon, Marie; Mercha, Abdelkarim; Mallik, Arindam; Chiarella, Thomas; Kubicek, Stefan; Athimulam, Raja; Collaert, Nadine; Horiguchi, Naoto; Debusschere, Ingrid; Thean, Aaron; Altimime, Laith; Verkest, Diederik (2012)

Thermal and SF6-plasma treatments for improved (sub-)1nm EOT planar and FinFET-based RMG high-k last devices and enabling a simplified scalable CMOS integration scheme

Veloso, Anabela; Boccardi, Guillaume; Ragnarsson, Lars-Ake; Higuchi, Yuichi; Arimura, Hiroaki; Lee, Jae Woo; Simoen, Eddy; Cho, Moon Ju; Roussel, Philippe; Paraschiv, Vasile; Shi, Xiaoping; Schram, Tom; Chew, Soon Aik; Brus, Stephan; Dangol, Anish; Vecchio, Emma; Sebaai, Farid; Kellens, Kristof; Heylen, Nancy; Devriendt, Katia; Dekkers, Harold; Van Ammel, Annemie; Witters, Thomas; Conard, Thierry; Vaesen, Inge; Richard, Olivier; Bender, Hugo; Athimulam, Raja; Chiarella, Thomas; Thean, Aaron; Horiguchi, Naoto (2013)