Browsing by author "Mankelevich, Yuri"

Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

Zyulkov, Ivan; Voronina, Ekaterina; Krishtab, Mikhail; Voloshin, Dmitry; Chan, BT; Mankelevich, Yuri; Rakhimova, Tatyana; Armini, Silvia; De Gendt, Stefan (2020)

Damage free cryogenic etching of porous organosilica ultralow-k film

Zhang, Liping; Liazouli, Remi; Dussart, Rami; Lefaucheux, Philippe; Tillocher, Thomas; de Marneffe, Jean-Francois; De Gendt, Stefan; Mankelevich, Yuri; Baklanov, Mikhaïl (2012)

Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4

Zhang, Liping; Ljazouli, Rami; Lefaucheux, Philippe; Tillocher, Thomas; Dussart, Remi; Mankelevich, Yuri; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl (2013)

Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers

Marinov, Daniil; de Marneffe, Jean-Francois; Smets, Quentin; Arutchelvan, Goutham; Bal, Kristof M.; Voronina, Ekaterina; Rakhimova, Tatyana; Mankelevich, Yuri; El Kazzi, Salim; Nalin Mehta, Ankit; Wyndaele, Pieter-Jan; Heyne, Markus Hartmut; Zhang, Jianran; With, Patrick C.; Banerjee, Sreetama; Neyts, Erik C.; Asselberghs, Inge; Lin, Dennis; De Gendt, Stefan (2021)

Recombination of O and H atoms on the surface of nanoporous dielectrics

Rakhimova, Tatyana; Braginsky, Oleg; Kovalev, Alexander; Lopaev, Dmutry; Mankelevich, Yuri; Malykhin, E; Rakhimov, Alexander; Vasilieva, Anna; Zyryanov, Sergei; Baklanov, Mikhaïl (2009)

Surface-confined activation of ultra low-k dielectrics in CO2 plasma

Sun, Yiting; Krishtab, Mikhail; Mankelevich, Yuri; Zhang, Liping; De Feyter, Steven; Baklanov, Mikhaïl; Armini, Silvia (2016)