Browsing by author "Marschner, Thomas"
Now showing items 1-12 of 12
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CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998) -
CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Vandenberghe, Geert; Marschner, Thomas; Ronse, Kurt; Socha, R.; Dusa, M. (1999) -
EUV mask defect inspection for the 3nm technology node
Hermans, Yannick; Heil, Tilmann; Capelli, Renzo; Szafranek, Bartholomaeus; Rhinow, Daniel; Mette, Gerson; Salg, Patrick; Hermanns, Chistian Felix; Dey, Bappaditya; Halipre, Luc; Trivkovic, Darko; Rincon Delgadillo, Paulina; Marschner, Thomas; Halder, Sandip (2023) -
Exploring capabilities of electrical linewidth measurement (ELM) techniques
Rangelov, Ventzeslav; Sarstedt, Margit; Somerville, John; Marschner, Thomas; Jonckheere, Rik; Poelaert, Abel (2001) -
Intra-wafer CD-control in state-of-the-art lithography
Pollentier, Ivan; Baerts, Christina; Marschner, Thomas; Ronse, Kurt; Grozev, Grozdan; Reybrouck, Mario (1999) -
Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
Marschner, Thomas; Pollentier, Ivan; Baerts, Christina; Boltz, Ingo; Ronse, Kurt; Van den hove, Luc; Finders, Jo; Gangala, Hareen K; Capodieci, Luigi (1998) -
Reticle imaging and metrology using a CD-SEM at IMEC
James, A.; Felten, F.; Polli, M.; England, J.; Marschner, Thomas; Vandenberghe, Geert (2000) -
Role of LV-SEM reticle CD measurements on DUV lithography
Marschner, Thomas; Pollentier, Ivan; Potoms, Goedele; Jonckheere, Rik; Ronse, Kurt; Polli, M. (1999) -
Some challenges for mask making to keep up with the roadmap
Jonckheere, Rik; Randall, John; Marschner, Thomas; Ronse, Kurt (1998) -
Some challenges for mask making to keep up with the roadmap
Jonckheere, Rik; Randall, John; Marschner, Thomas; Ronse, Kurt (1998) -
Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system
Finders, Jo; Mulders, A. M.; Krist, J.; Flagello, D.; Luehrmann, P.; Maenhoudt, Mireille; Marschner, Thomas; De Bisschop, Peter; Ronse, Kurt (1998) -
Variable threshold resist models for lithography simulation
Randall, John; Ronse, Kurt; Marschner, Thomas; Goethals, Mieke; Ercken, Monique (1999)