EUV mask defect inspection for the 3nm technology node

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Authors

Hermans, Yannick; Heil, Tilmann; Capelli, Renzo; Szafranek, Bartholomaeus; Rhinow, Daniel; Mette, Gerson; Salg, Patrick; Hermanns, Chistian Felix; Dey, Bappaditya; Halipre, Luc; Trivkovic, Darko; Rincon Delgadillo, Paulina; Marschner, Thomas; Halder, Sandip

ISSN

0277-786X

Conference

38th European Mask and Lithography Conference (EMLC 2023)

Journal

Proceedings of SPIE

Title

EUV mask defect inspection for the 3nm technology node

Publication type

Proceedings paper

Embargo date

2023-10-05

Collections

Conference contributions