Browsing by author "Trivkovic, Darko"
Now showing items 1-20 of 23
-
21 nm Pitch dual-damascene BEOL process integration with full barrierless Ru metallization
Vega Gonzalez, Victor; Wilson, Chris; Paolillo, Sara; Decoster, Stefan; Mao, Ming; Versluijs, Janko; Blanco, Victor; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Varela Pedreira, Olalla; Lesniewska, Alicja; Heylen, Nancy; El-Mekki, Zaid; van der Veen, Marleen; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Jourdan, Nicolas; Ciofi, Ivan; Contino, Antonino; Boccardi, Guillaume; Lariviere, Stephane; De Wachter, Bart; Vancoille, Eric; Lazzarino, Frederic; Ercken, Monique; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Pardons, Katrien; Barla, Kathy; Tokei, Zsolt (2019) -
A yield prediction model and cost of ownership for productivity enhancement beyond imec 5nm technology node
Tsai, Yi-Pei; Chang, Yi-Han; Wang, Jane; Trivkovic, Darko; Ronse, Kurt; Kim, Ryan Ryoung han (2022) -
Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective
Mirabelli, Gioele; Wang, Jane; Trivkovic, Darko; Weckx, Pieter; Spessot, Alessio; Ronse, Kurt; Kim, Ryan Ryoung han; Hellings, Geert; Ryckaert, Julien (2021) -
Design and pitch scaling for affordable node transition and EUV insertion scenario
Kim, Ryan Ryoung han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Lariviere, Stephane; McIntyre, Greg (2017) -
EUV single patterning for logic metal layers: achievement and challenge
Kim, Ryan Ryoung han; Gillijns, Werner; Drissi, Youssef; Trivkovic, Darko; Blanco, Victor; Lariviere, Stephane; De Ruyter, Rudi; Dehan, Morin; McIntyre, Greg; Tan, Ling Ee (2017) -
Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03) -
Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010) -
Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009) -
imec's iN5 BEOL patterning development
Li, Waikin; Mao, Ming; Trivkovic, Darko; Murdoch, Gayle; Halder, Sandip; Ercken, Monique (2017) -
Impact of a SADP flow on the design and process for N10/N7 layers
Gillijns, Werner; Sherazi, Yasser; Trivkovic, Darko; Chava, Bharani; Vandewalle, B.; Gerousis, V.; Raghavan, Praveen; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; McIntyre, Greg; Ronse, Kurt (2015) -
Integration challenges of spin torque majority gatelogic
Wilson, Chris; Manfrini, Mauricio; Thiam, Arame; Souriau, Laurent; Babaei Gavan, Khashayar; Rassoul, Nouredine; Radisic, Dunja; Vaysset, Adrien; Trivkovic, Darko; Ercken, Monique; Swerts, Johan; Briggs, Basoene; Sayan, Safak; Radu, Iuliana; Mocuta, Dan (2016) -
Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
Sakhare, Sushil; Trivkovic, Darko; Mountsier, Tom; Kim, Min-Soo; Mocuta, Dan; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron; Dusa, Mircea (2015) -
Metal stack optimization for low-power and high-density for N7-N5
Raghavan, Praveen; Firouzi, Farshad; Matti, L.; Debacker, Peter; Baert, Rogier; Sherazi, Yasser; Trivkovic, Darko; Gerousis, V.; Dusa, Mircea; Ryckaert, Julien; Tokei, Zsolt; Verkest, Diederik; McIntyre, Greg; Ronse, Kurt (2016) -
N5 BEOL process options patterning flows comparing 193immersion to hybrid EUV or full EUV
Lariviere, Stephane; Briggs, Basoene; Wilson, Chris; Mallik, Arindam; Decoster, Stefan; Wan, Danny; Bekaert, Joost; Blanco, Victor; Mao, Ming; Paolillo, Sara; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Boemmels, Juergen; Trivkovic, Darko; Tokei, Zsolt; McIntyre, Greg; Mocuta, Dan (2017) -
OPC resist model separability validation after SMO source change
Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu (2013) -
Patterning challenges for beyond 3nm logic devices: Example of an interconnected magnetic tunnel junction
Thiam, Arame; Wan, Danny; Souriau, Laurent; Babaei Gavan, Khashayar; Rassoul, Nouredine; Swerts, Johan; Couet, Sebastien; Raymenants, Eline; Jussot, Julien; Trivkovic, Darko; Ercken, Monique; Wilson, Chris; Radu, Iuliana (2019) -
Process development using negative tone development for the dark field critical layers in a 28 nm node process
Versluijs, Janko; Truffert, Vincent; Murdoch, Gayle; De Bisschop, Peter; Trivkovic, Darko; Wiaux, Vincent; Kunnen, Eddy; Souriau, Laurent; Demuynck, Steven; Ercken, Monique (2012) -
Reticle enhancement techniques toward iN7 metal2
Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Trivkovic, Darko; Kim, Ryan Ryoung han; Gallagher, Emily; McIntyre, Greg (2017) -
Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso (2017) -
Spin torque majority gate devices: towards 300mm wafer integration
Manfrini, Mauricio; Vaysset, Adrien; Ciubotaru, Florin; Yan, Jingdong; Radisic, Dunja; Ercken, Monique; Trivkovic, Darko; Swerts, Johan; Briggs, Basoene; Wilson, Chris; Lin, Dennis; Mocuta, Anda; Nikovov, D.E; Sayan, S; Manipatruni, S.; Young, I. A.; Radu, Iuliana; Thean, Aaron (2016)