Authors

Sakhare, Sushil; Trivkovic, Darko; Mountsier, Tom; Kim, Min-Soo; Mocuta, Dan; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron; Dusa, Mircea

Conference

Design-Process-Technology Co-optimization for Manufacturability IX

Title

Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node

Publication type

Proceedings paper