Browsing by author "Dusa, Mircea"
Now showing items 1-20 of 43
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure
Das, Sayantan; Kisson, Nicola; Mahmud Ul Hasan, Hasan MD; Rynders, Luc; Kljucar, Luka; Halder, Sandip; Leray, Philippe; Dusa, Mircea; Rio, David; Mohsen, Mahmoud; Spence, Chris; De Poortere, Etienne (2021) -
3D features measurement using YieldStar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, Paul; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, P.; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
A single metrology tool solution for complete exposure tool setup
Laidler, David; D'have, Koen; Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Vanoppen, Peter; Hinnen, Paul (2010) -
Critical assessment of error budget components in double patterning immersion lithography
Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Fliervoet, Timon; Hepp, Birgitt; Megens, henry; Groenendijk, Remco; Quaedackers, John; Mos, Evert; Leewis, Christian; Bornebroek, Frank; Maenhoudt, Mireille; Leblans, Marc; Vandeweyer, Tom; Murdoch, Gayle; Altamirano Sanchez, Efrain (2009) -
Design technology co-optimization for a robust 10nm solution for logic design and Sram
Vandewalle, Boris; Chava, Bharani; Sakhare, Sushil; Ryckaert, Julien; Dusa, Mircea (2014) -
Design technology co-optimization for N10
Ryckaert, Julien; Raghavan, Praveen; Baert, Rogier; Garcia Bardon, Marie; Dusa, Mircea; Mallik, Arindam; Sakhare, Sushil; Vandewalle, Boris; Wambacq, Piet; Chava, Bharani; Croes, Kris; Dehan, Morin; Jang, Doyoung; Leray, Philippe; Liu, Tsung-Te; Miyaguchi, Kenichi; Parvais, Bertrand; Schuddinck, Pieter; Weemaes, Philippe; Mercha, Abdelkarim; Boemmels, Juergen; Horiguchi, Naoto; McIntyre, Greg; Thean, Aaron; Tokei, Zsolt; Cheng, Shaunee; Verkest, Diederik; Steegen, An (2014) -
Double patterning for 32-nm and below: an update
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Megens, Henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2009) -
Edge placement error analysis for N7 logic patterning options
van Setten, Eelco; Psara, Eleni; Wittebrood, Friso; Oorschot, Dorothe; van Dijk, Joep; Schiffelers, Guido; Finders, Jo; Dusa, Mircea; Philipsen, Vicky; Hendrickx, Eric (2015) -
Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea (2010) -
Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Focus and dose de-convolution technique for improved CD-control of immersion clusters
Charley, Anne-Laure; D'have, Koen; Leray, Philippe; Laidler, David; Cheng, Shaunee; Dusa, Mircea; Hinnen, Paul; Vanoppen, Peter (2010) -
Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010) -
Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009)