Browsing by author "Nannarone, Stefano"
Now showing items 1-6 of 6
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Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Fallica, Roberto; Nannarone, Stefano; Mahne, Nicola; Malvezzi, Andrea Marco; Berti, Andrea; De Simone, Danilo (2021) -
Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; Nannarone, Stefano (2023) -
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; de Simone, Danilo; Nannarone, Stefano (2023) -
Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
Vesters, Yannick; Shehzad, Atif; De Simone, Danilo; Pollentier, Ivan; Nannarone, Stefano; Vandenberghe, Geert; De Gendt, Stefan (2019) -
Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
Rezvani, Javid; Tchoudinov, Georghii; Nannarone, Stefano; Fallica, Roberto (2022-03-17) -
The hidden energy tail of low energy electrons in EUV lithography
Fallica, Roberto; Rezvani, Seyed Javid; Nannarone, Stefano; Borisov, Sergei; De Simone, Danilo; Babin, Sergey; Lorusso, Gian; Vandenberghe, Geert (2019)