Browsing by author "Bruls, R."
Now showing items 1-4 of 4
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Hard pellicle investigation for 157 nm lithography: impact on overlay
Bruls, R.; Uitterdijk, T.; Cicilia, O.; De Bisschop, Peter; Kocsis, Michael; Grenville, A.; Van Peski, C.; Engelstad, R.; Chang, J.; Cotte, E.; Okada, K.; Ohta, K.; Mishiro, H.; Kikugawa, S. (2004) -
Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Van Peski, C.; Grenville, A. (2004) -
Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
Kocsis, Michael; De Bisschop, Peter; Bruls, R.; Grenville, A.; Van Peski, C. (2004) -
Initial assessment of the lithographic impact of the use of hard pellicles : an overview
De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Grenville, A.; Van Peski, C. (2004)