Browsing by author "Eitoku, A."
Now showing items 1-7 of 7
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Aging phenomena in the removal of nano-particles from Si wafers
Vereecke, Guy; Veltens, J.; Xu, Kaidong; Eitoku, A.; Sano, Ken-Ichi; Arnauts, Sophia; Kenis, Karine; Snow, J.; Vinckier, Chris; Mertens, Paul (2008) -
Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
Sano, K.; Leys, Frederik; Dilliway, Gabriela; Loo, Roger; Mertens, Paul; Snow, J.; Izumi, A.; Eitoku, A. (2008) -
Effect of chemical growth air filter for wafer storage before epitaxial growth
Wada, Masayuki; Sano, Tomohiro; Leys, Frederik; Dilliway, G.; Loo, Roger; Mertens, Paul; Snow, j.; Izumi, A.; Eitoku, A. (2008) -
New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss
Wada, Masayuki; Vos, Rita; Claes, Martine; Schram, Tom; Snow, J.; Mertens, Paul; Eitoku, A. (2009) -
Particle removal from micrometer-sized trenches using high-velocity-aerosol cleaning and comparison with megasonic tank cleaning
Wostyn, Kurt; Sano, Ken-Ichi; Eitoku, A.; Janssens, Tom; Bearda, Twan; Leunissen, Peter; Mertens, Paul (2007) -
Removal of nano-particles by mixed-fluid jet: evaluation of cleaning performance and comparison with megasonic
Vereecke, Guy; Veltens, T.; Eitoku, A.; Sano, Ken-Ichi; Doumen, Geert; Fyen, Wim; Wostyn, Kurt; Snow, J.; Mertens, Paul (2008) -
Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
Sano, K.; Izumi, A.; Eitoku, A.; Snow, J.; Nyns, Laura; Kubicek, Stefan; Singanamalla, Raghunath; Richard, Olivier; Conard, Thierry; Vos, Rita; Mertens, Paul (2008)