Browsing by author "Babu, S.V."
Now showing items 1-10 of 10
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Chemical mechanical polishing and planarization of Mn-based barrier/Ru liner films in Cu interconnects for advanced metallization nodes
Sagi, K.V.; Teugels, Lieve; van der Veen, Marleen; Struyf, Herbert; Babu, S.V. (2017) -
Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structures
Sagi, K.V.; Teugels, Lieve; van der Veen, Marleen; Struyf, Herbert; Alety, S.R.; Babu, S.V. (2017) -
Chemical mechanical polishing of InP
Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S.V. (2012) -
Chemical mechanical polishing of manganese (Mn)-based barrier films in the BEOL interconnects for advanced metallization nodes
Sagi, Kaushik; Babu, S.V.; van der Veen, Marleen; Struyf, Herbert; Teugels, Lieve (2016) -
CMP of Ge and InP for microelectronic applications
Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S.V. (2011) -
Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways
Ong, Patrick; Matovu, J.B.; Leunissen, Peter; Krishnan, Sitaraman; Babu, S.V. (2013) -
Investigation of guanidine carbonate-based slurries for chemical Mechanical polishing of Ru/TiN barrier films with minimal corrosion
Sagi, K.V.; Amanapu, H.P.; Teugels, Lieve; Babu, S.V. (2014) -
Role of ruthenium texture and guanidine carbonate on chemical mechanical polishing of ruthenium films
Amanapu, Hariprasad; Sagi, Kaushik; Teugels, Lieve; Babu, S.V. (2013) -
The effect of material texture in the CMP of ruthenium films
Teugels, Lieve; Amanapu, Hariprasad; Sagi, Kaushik; Heylen, Nancy; Babu, S.V. (2013) -
Use of multifunctional carboxylic acids and hydrogen peroxide to improve surface quality and minimize phosphine evolution during chemical mechanical polishing of indium phosphide surfaces
Matovu, John Bogere; Ong, Patrick; Krishnan, Sitaraman; Babu, S.V.; Leunissen, Peter (2013)