Browsing by author "Smith, Bruce W."
Now showing items 1-5 of 5
-
EUV resist requirements: absorbance and acid yield
Gronheid, Roel; Fonseca, Carlos; Leeson, Michael; Adams, Jacob; Strahan, Jeff; Willson, C. Grant; Smith, Bruce W. (2009) -
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Kempsell, Monica; Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Yasui, Kenichi; Yoshitake, Susuki; Granik, Yuri; Vandenberghe, Geert; Smith, Bruce W. (2009) -
Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography
Kempsell Sears, Monica; Bekaert, Joost; Smith, Bruce W. (2013) -
Pupil wavefront manipulation for optical nanolithography
Kempsell Sears, Monica; Bekaert, Joost; Smith, Bruce W. (2012) -
The impact of pupil plane filtering on mask roughness transfer
Baylav, Burak; Maloney, Chris; Levinson, Zac; Bekaert, Joost; Vaglio Pret, Alessandro; Smith, Bruce W. (2013)