Browsing by author "Kraus, Harald"
Now showing items 21-25 of 25
-
Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
Claes, Martine; Paraschiv, Vasile; Beckx, Stephan; Demand, Marc; Deweerd, Wim; Garaud, Sylvain; Kraus, Harald; Vos, Rita; Snow, Jim; Boullart, Werner; De Gendt, Stefan (2004) -
Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks
Claes, Martine; Paraschiv, Vasile; Beckx, Stephan; Demand, Marc; Deweerd, Wim; Garaud, Sylvain; Kraus, Harald; Vos, Rita; Snow, Jim; Boullart, Werner; De Gendt, Stefan (2005) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2005) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2004)