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Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks

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1897 since deposited on 2021-10-16
1last month
Acq. date: 2026-02-25

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Views

1897 since deposited on 2021-10-16
1last month
Acq. date: 2026-02-25

Citations