Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks

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Author(s)

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Paraschiv, Vasile

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Garaud, Sylvain

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Boullart, Werner

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De Gendt, Stefan

Metrics

1890 since deposited on 2021-10-16

Acq. date: 2025-10-23