Publication:
Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
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1961 since deposited on 2021-10-15
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Acq. date: 2025-12-08
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Views
1961 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2025-12-08
Citations