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Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
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1963 since deposited on 2021-10-15
2last month
Acq. date: 2026-01-06
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Metrics
Views
1963 since deposited on 2021-10-15
2last month
Acq. date: 2026-01-06
Citations