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Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
Publication:
Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
Date
2004
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Claes, Martine
;
Paraschiv, Vasile
;
Beckx, Stephan
;
Demand, Marc
;
Deweerd, Wim
;
Garaud, Sylvain
;
Kraus, Harald
;
Vos, Rita
;
Snow, Jim
;
Boullart, Werner
;
De Gendt, Stefan
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1957
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1957
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations