Browsing by author "Socha, R."
Now showing items 1-4 of 4
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CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Vandenberghe, Geert; Marschner, Thomas; Ronse, Kurt; Socha, R.; Dusa, M. (1999) -
Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
Engelen, A.; Socha, R.; Hendrickx, Eric; Scheepers, W.; Nowak, F.; van Dam, M.; Liebchen, Armin; Faas, D. (2004) -
Mask topography effect in chromeless phase lithography
Philipsen, Vicky; Bekaert, Joost; Vandenberghe, Geert; Jonckheere, Rik; Van Den Broecke, D.; Socha, R. (2004) -
Optical solutions for contact hole lithography at the 90nm node and beyond
Köhler, C.; Elbattay, K.; Hansen, S.; Finders, Jo; Socha, R.; van den Broeke, D.; Wiaux, Vincent; Vandenberghe, Geert; Gräupner, P. (2002)