Browsing by author "Osaki, Mayuka"
Now showing items 1-3 of 3
-
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2009)