Browsing by author "Osaki, Mayuka"
Now showing items 1-4 of 4
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Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Cu Pad Surface Height Evaluation Technique by In-line SEM for Wafer Hybrid Bonding
Kasai, Hiroaki; Osaki, Mayuka; Hasumi, Kazuhisa; Mise, Nobuyuki; Tanaka, Maki; Tunca Altintas, Bensu; Chew, Soon Aik; Bogdanowicz, Janusz; Moussa, Alain; Saib, Mohamed; Zhang, Boyao; Charley, Anne-Laure (2024) -
Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2009)