Authors

Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain

Conference

Metrology, Inspection, and Process Control for Microlithography XXII

Title

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

Publication type

Proceedings paper

Embargo date

9999-12-31