Browsing by author "Yang, Lijun"
Now showing items 1-9 of 9
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Atomic layer doping of phosphorus and arsenic: experimental and atomistic modeling
Takeuchi, Shotaro; Yang, Lijun; Nguyen, Duy; Loo, Roger; Conard, Thierry; Pourtois, Geoffrey; Vandervorst, Wilfried; Caymax, Matty (2008) -
Ge-H empirical potential and simulation of Si epitaxy on Ge(100) by chemical vapor deposition from SiH4
Yang, Lijun; Pourtois, Geoffrey; Caymax, Matty; Ceulemans, Arnout; Heyns, Marc (2009) -
Si passivation for high-k gate dielectrics on GE MOSFETs: further developments and understanding
Caymax, Matty; Mitard, Jerome; Martens, Koen; Yang, Lijun; Pourtois, Geoffrey; Vandervorst, Wilfried; Meuris, Marc; Loo, Roger (2009) -
Si passivation in Ge pMOSFETS: further developments and understanding
Caymax, Matty; Leys, Frederik; Mitard, Jerome; Martens, Koen; Yang, Lijun; Pourtois, Geoffrey; Vandervorst, Wilfried; Loo, Roger; Meuris, Marc (2008) -
Si passivation in Ge pMOSFETS: further developments and understanding
Caymax, Matty; Mitard, Jerome; Martens, Koen; Yang, Lijun; Pourtois, Geoffrey; Vandervorst, Wilfried; Meuris, Marc (2008) -
The influence of the epitaxial growth process parameters on layer characteristics and device performance in Si-passivated Ge pMOSFETs
Caymax, Matty; Leys, Frederik; Mitard, Jerome; Martens, Koen; Yang, Lijun; Pourtois, Geoffrey; Vandervorst, Wilfried; Meuris, Marc; Loo, Roger (2009) -
The influence of the epitaxial growth process parameters on layer characteristics and device performance in Si-passivated Ge pMOSFETs
Caymax, Matty; Leys, Frederik; Mitard, Jerome; Martens, Koen; Yang, Lijun; Pourtois, Geoffrey; Vandervorst, Wilfried; Meuris, Marc; Loo, Roger (2009) -
Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Yang, Lijun; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Loo, Roger; Lin, Vic; Vandervorst, Wilfried; Caymax, Matty (2009) -
Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Yang, Lijun; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Richard, Olivier; Bender, Hugo; Zaima, S.; Sakai, A.; Loo, Roger; Lin, J.C.; Vandervorst, Wilfried; Caymax, Matty (2010)