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Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
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Authors
Nguyen, Duy
;
Rosseel, Erik
;
Takeuchi, Shotaro
;
Everaert, Jean-Luc
;
Yang, Lijun
;
Goossens, Jozefien
;
Moussa, Alain
;
Clarysse, Trudo
;
Loo, Roger
;
Lin, Vic
;
Vandervorst, Wilfried
;
Caymax, Matty
Conference
Abstracts 6th International Conference on Silicon Epitaxy and Heterostructures - ICSI-6
Title
Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Publication type
Meeting abstract
Embargo date
9999-12-31
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