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Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
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1 since deposited on 2021-10-18
Acq. date: 2025-12-10
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1942 since deposited on 2021-10-18
Acq. date: 2025-12-10
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Downloads
1 since deposited on 2021-10-18
Acq. date: 2025-12-10
Views
1942 since deposited on 2021-10-18
Acq. date: 2025-12-10
Citations