Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology

Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Yang, Lijun; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Loo, Roger; Lin, Vic; Vandervorst, Wilfried; Caymax, Matty

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Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology

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2009

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Vandervorst, Wilfried

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Caymax, Matty

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1 since deposited on 2021-10-18

Acq. date: 2026-07-07

1943 since deposited on 2021-10-18

Acq. date: 2026-07-07

Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology

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