Browsing by author "Iino, Hideaki"
Now showing items 1-5 of 5
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Characterization of Wetting of Deep Silica Nanoholes by Aqueous Solutions Using ATR-FTIR
Darcos, Audrey; Iino, Hideaki; Vereecke, Guy; Holsteyns, Frank; Altamirano Sanchez, Efrain (2021) -
Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing
Iino, Hideaki; Tanaka, Yoichi; Gan, Nobuko; Fukui, Takeo; Akanishi, Yuya; Iwahata, Shota; Oniki, Yusuke; Altamirano Sanchez, Efrain; Holsteyns, Frank (2021) -
Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
Wostyn, Kurt; Dhayalan, Sathish Kumar; Gencarelli, Federica; Masaoku, Toru; Iino, Hideaki; Yoshida, Yukifumi; Komori, Kana; Douhard, Bastien; Hikavyy, Andriy; Loo, Roger; Holsteyns, Frank (2018-05) -
Study of cobalt etch control by pH and oxidizer
Ogawa, Yuichi; Gan, Nobuko; Masaoka, Toru; Yoshimura, Minami; Iino, Hideaki; Le, Quoc Toan; Kesters, Els; Akanishi, Yuya; Holsteyns, Frank (2018) -
Study on La2O3 wet clean by pH controlled functional water
Ogawa, Yuichi; Iino, Hideaki; Fukui, Takeo; Oniki, Yusuke; Akanishi, Yuya; Altamirano Sanchez, Efrain; Holsteyns, Frank (2019)