Browsing by author "Graves, Trey"
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Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Bai, Kunlun; Robertson, Stewart; De Bisschop, Peter; Biafore, J. (2018) -
DSA graphoepitaxy calibrations for contact hole multiplication
Graves, Trey; Vaglio Pret, Alessandro; Robertson, Stuart; Smith, Mark; Doise, Jan; Bekaert, Joost; Gronheid, Roel (2015) -
Impact of mask line roughness in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Mask absorber roughness impact in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Statistical simulation of resist at EUV and ArF
Biafore, John; Smith, Mark; Mack, Chris A.; Thackeray, James; Gronheid, Roel; Robertson, Stewart; Graves, Trey; Blankenship, David (2009)