Browsing by author "Frank, Martin M."
Now showing items 1-5 of 5
-
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine (2008) -
Enhanced initial growth of atomic layer deposited metal oxides on hydrogen-terminated silicon
Frank, Martin M.; Chabal, Yves J.; Green, Martin; Delabie, Annelies; Brijs, Bert; Wilk, Glen D.; Ho, Mun-Yee; da Rosa, Elisa B.O.; Baumvol, Israel J.R.; Stedile, Fernanda C. (2003) -
Germanium surface conditioning and passivation
Sioncke, Sonja; Chabal, Yves J.; Frank, Martin M. (2011) -
Photoresist characterization and wet strip after low-k dry etch
Claes, Martine; Le, Quoc Toan; Keldermans, J.; Kesters, Els; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, R.; Adriaensens, P.; Vanderzande, Dirk (2008) -
Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
Totir, George; Frank, Martin M.; Vos, Rita; Arnauts, Sophia; Bearda, Twan; Kenis, Karine; Delande, Tinne; Le, Quoc Toan; Kesters, Els; Vereecke, Guy; Mannaert, Geert; Lux, Marcel; Hoflijk, Ilse; Conard, Thierry; Banerjee,; Malhouitre, Stephane; Leunissen, Peter; Mertens, Paul (2007)