Browsing by author "Liu, Hua-Yu"
Now showing items 1-3 of 3
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Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Driessen, Frank; Philipsen, Vicky; Jonckheere, Rik; Liu, Hua-Yu; Karklin, Linard (2002) -
OPC resist model separability validation after SMO source change
Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu (2013) -
Separable models for computational lithography
Liu, Hua-Yu; Zhao, Q.; Chen, J.F.; Jiang, J.; Socha, B.; Van Setten, E.; Engelen, A.; Meessen, J.; Crouse, M.M.; Feng, M.; Shao, W.; Cao, H.; Cao, Y.; Van Look, Lieve; Bekaert, Joost; Vandenberghe, Geert; Finders, Jo (2008)