Browsing by author "Kumar, Kaushik"
Now showing items 1-12 of 12
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Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Enabling 3-level High Aspect Ratio Supervias for 3nm nodes and below
Montero Alvarez, Daniel; Vega Gonzalez, Victor; Feurprier, Yannick; Varela Pedreira, Olalla; Oikawa, Noriaki; Martinez Alanis, Gerardo Tadeo; Batuk, Dmitry; Puliyalil, Harinarayanan; Versluijs, Janko; De Coster, Hanne; Bazzazian, Nina; Jourdan, Nicolas; Kumar, Kaushik; Lazzarino, Frederic; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt (2022-06-29) -
Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors
Kal, Subhadeep; Oniki, Yusuke; Falugh, Matthew; Pereira, Cheryl; Wang, Qi; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Boemmels, Juergen; Ryckaert, Julien; Biolsi, Peter; Hurd, Trace Q (2019) -
Etch challenges in high aspect ratio aupervia patterning
Puliyalil, Harinarayanan; Feurprier, Yannick; Briggs, Basoene; Lazzarino, Frederic; Wilson, Chris; Kumar, Kaushik (2019) -
Etch tool pressure optimization enabling wafer edge overlay control.
Yildirim, Oktay; van Haren, Richard; Mouraille, Orion; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Feurprier, Yannick (2020) -
High Aspect Ratio Supervia Dual Damascene etch for iN5 and beyond
Puliyalil, Harinarayanan; Feurprier, Yannick; Oikawa, Noriaki; Vega Gonzalez, Victor; Briggs, Basoene; Montero Alvarez, Daniel; Lazzarino, Frederic; Tokei, Zsolt; Satoru, Nakamura; Tahara, Shigeru; Kumar, Kaushik (2021) -
Intra-field etch induced overlay penalties
van Haren, Richard; Yildirim, Oktay; Mouraille, Orion; van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2020) -
On product overlay characterization after stressed layer etch
van Haren, Richard; Mouraille, Orion; Yildirim, Oktay; Van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2021) -
Plasma etch selectivity study and material screening for Self-Aligned Gate Contact (SAGC)
Radisic, Dunja; Demand, Marc; Chan, Shihsheng; Demuynck, Steven; Kumar, Kaushik; Metz, Andrew; Teugels, Lieve; Sun, Junling; Smith, Jeffrey; Sebaai, Farid; Hopf, Toby; Altamirano Sanchez, Efrain (2019) -
Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
Decoster, Stefan; Paolillo, Sara; Kesters, Els; Briggs, Basoene; van der Veen, Marleen; Lazzarino, Frederic; Piumi, Daniele; Yamashita, Fumiko; Demand, Marc; Kumar, Kaushik (2016) -
Selective isotropic etching of Group IV semiconductors to enable gate all around device architectures
Kal, Subhadeep; Pereira, Cheryl; Oniki, Yusuke; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2018) -
Si trim applications: benefits and challenges
Kal, Subhadeep; Oniki, Yusuke; Pereira, Cheryl; Holsteyns, Frank; Chanemougame, Daniel; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2019)