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Plasma etch selectivity study and material screening for Self-Aligned Gate Contact (SAGC)
Publication:
Plasma etch selectivity study and material screening for Self-Aligned Gate Contact (SAGC)
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Date
2019
Proceedings Paper
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40875.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Radisic, Dunja
;
Demand, Marc
;
Chan, Shihsheng
;
Demuynck, Steven
;
Kumar, Kaushik
;
Metz, Andrew
;
Teugels, Lieve
;
Sun, Junling
;
Smith, Jeffrey
;
Sebaai, Farid
;
Hopf, Toby
;
Altamirano Sanchez, Efrain
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Statistics
Views
2235
since deposited on 2021-10-27
6
last month
1
last week
Acq. date: 2026-01-27
Citations