Publication:

Plasma etch selectivity study and material screening for Self-Aligned Gate Contact (SAGC)

Date

2019

Proceedings Paper

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Files

40875.pdf 4.88 MB

Author(s)

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Chan, Shihsheng

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Demuynck, Steven

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Altamirano Sanchez, Efrain

Statistics

2261 since deposited on 2021-10-27

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Acq. date: 2026-04-06