Browsing by author "Juffermans, Casper"
Now showing items 1-6 of 6
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248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
Application of a new approach to optical proximity correction
Rosenbusch, A.; Hourd, A.; Juffermans, Casper; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Vermeulen, Tom; Watson, J.; Ziegler, W.; Zimmerman, R. (1999) -
Characterization of a projection lens using the extended Nijboer-Zernike approach
Dirksen, Peter; Braat, Joseph; De Bisschop, Peter; Janssen, Augustus J.E.M.; Juffermans, Casper; Williams, Alvina (2002) -
Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Singanamalla, Raghunath; Van Dal, Mark; Demand, Marc; Shamiryan, Denis; Beckx, Stephan; Jaenen, Patrick; Locorotondo, Sabrina; Yu, HongYu; Hooker, Jacob; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Juffermans, Casper; Lander, Rob (2007-04) -
Novel aberration monitor for optical lithography
Dirksen, Peter; Juffermans, Casper; Pellens, R. J.; Maenhoudt, Mireille; De Bisschop, Peter (1999) -
Optical proximity correction for 0.3 μm i-line lithography
Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc (1996)