Browsing by author "Biafore, John J."
Now showing items 1-6 of 6
-
Characterizing and modeling electrical response to light for metal based EUV photoresists
Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016) -
Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D. (2011) -
Investigation of interactions between metrology and lithography with a CD SEM simulator
Smith, Mark D.; Fang, Chao; Biafore, John J.; Vaglio Pret, Alessandro; Robinson, Stewart A. (2014) -
Modelling the lithography of ion implantation resists on topography
Winroth, Gustaf; Vaglio Pret, Alessandro; Ercken, Monique; Robertson, Stewart; Biafore, John J. (2014) -
Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations
Fang, Chao; Vaglio Pret, Alessandro; Smith, Mark D.; Biafore, John J.; Robertson, Steward; Bekaert, Joost (2015) -
XAS photoresists electron/quantum yields study with synchrotron light
De Schepper, Peter; Vaglio Pret, Alessandro; Hansen, Terje; Giglia, Angelo; Hoshiko, Kenji; Mani, Antonio; Biafore, John J. (2015)