Browsing by author "Delvaux, Christie"
Now showing items 21-34 of 34
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Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
Van Dal, Mark; Collaert, Nadine; Doornbos, Gerben; Vellianitis, Georgios; Curatola, Gilberto; Pawlak, Bartek; Duffy, Ray; Jonville, Carole; Degroote, Bart; Altamirano Sanchez, Efrain; Kunnen, Eddy; Demand, Marc; Beckx, Stephan; Vandeweyer, Tom; Delvaux, Christie; Leys, Frederik; Hikavyy, Andriy; Rooyackers, Rita; Kaiser, M.; Weemaes, R.G.R.; Biesemans, Serge; Jurczak, Gosia; Kottantharayil, Anil; Witters, Liesbeth; Lander, Rob (2007) -
How to use DUV BARCs on topography
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt (1998) -
Improvements in the measurement of local critical dimension uniformity for holes and pillars
Mack, Chris A.; Delvaux, Christie; De Simone, Danilo; Lorusso, Gian (2023) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Junctionless gate-all-around lateral and vertical nanowire FETs with simplified processing for advanced logic and analog/RF applications and scaled SRAM cells
Veloso, Anabela; Parvais, Bertrand; Matagne, Philippe; Simoen, Eddy; Huynh Bao, Trong; Paraschiv, Vasile; Vecchio, Emma; Devriendt, Katia; Rosseel, Erik; Ercken, Monique; Chan, BT; Delvaux, Christie; Altamirano Sanchez, Efrain; Versluijs, Janko; Tao, Zheng; Suhard, Samuel; Brus, Stephan; Sibaja-Hernandez, Arturo; Waldron, Niamh; Lagrain, Pieter; Richard, Olivier; Bender, Hugo; Vaisman Chasin, Adrian; Kaczer, Ben; Ivanov, Tsvetan; Ramesh, Siva; De Meyer, Kristin; Ryckaert, Julien; Collaert, Nadine; Thean, Aaron (2016) -
Line edge roughness and its increasing importance
Ercken, Monique; Storms, Greet; Delvaux, Christie; Vandenbroeck, Nadia; Leunissen, Peter; Pollentier, Ivan (2002) -
Optimisation of bottom-ARC processes with respect to CD control
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C. (1998) -
Precuring implant photoresists for shrink and patterning control
Winroth, Gustaf; Rosseel, Erik; Delvaux, Christie; Altamirano Sanchez, Efrain; Ercken, Monique (2013) -
Precuring implant photoresists for shrink and patterning control
Winroth, Gustaf; Rosseel, Erik; Delvaux, Christie; Altamirano Sanchez, Efrain; Ercken, Monique (2013) -
SiON ARC: Material characterization and implication in lithographic process
Zhang, Fenghong; Pollentier, Ivan; Eliat, Astrid; Delvaux, Christie; Ronse, Kurt (2000) -
Status of ArF lithography for the 130nm technology node
Ronse, Kurt; Vandenberghe, Geert; Jaenen, Patrick; Delvaux, Christie; Vangoidsenhoven, Diziana; Van Roey, Frieda; Pollers, Ingrid; Maenhoudt, Mireille; Goethals, Mieke; Pollentier, Ivan; Vleeming, Bert; van Ingen Schenau, K.; Heskamp, B.; Davies, G.; Finders, Jo; Niroomand, Ardavan (2000) -
The influence of wafer soaking and top coat processing on resist profile control in immersion lithography
Foubert, Philippe; Vandenbroeck, Nadia; Delvaux, Christie; Pollentier, Ivan; Ercken, Monique (2005) -
Vertical nanowire FET integration and device aspects
Veloso, Anabela; Altamirano Sanchez, Efrain; Brus, Stephan; Chan, BT; Cupak, Miroslav; Dehan, Morin; Delvaux, Christie; Devriendt, Katia; Eneman, Geert; Ercken, Monique; Huynh Bao, Trong; Ivanov, Tsvetan; Matagne, Philippe; Merckling, Clement; Paraschiv, Vasile; Ramesh, Siva; Rosseel, Erik; Rynders, Luc; Sibaja-Hernandez, Arturo; Suhard, Samuel; Tao, Zheng; Vecchio, Emma; Waldron, Niamh; Yakimets, Dmitry; De Meyer, Kristin; Mocuta, Dan; Collaert, Nadine; Thean, Aaron (2016)