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Modelling and experimental evaluation of (post) lithography process contributions to pattern roughness
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Modelling and experimental evaluation of (post) lithography process contributions to pattern roughness
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Date
2012-07
Dissertation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
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1912
since deposited on 2021-10-20
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Acq. date: 2025-12-15
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Metrics
Views
1912
since deposited on 2021-10-20
1
last month
Acq. date: 2025-12-15
Citations