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Modelling and experimental evaluation of (post) lithography process contributions to pattern roughness

Date

2012-07
Dissertation
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.departmentf06239d8-b76d-49df-a21f-7c8d02eb6e2d
cris.virtualsource.orcidf06239d8-b76d-49df-a21f-7c8d02eb6e2d
dc.contributor.advisorLuc Van den hove
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.thesisadvisorVan den hove, Luc
dc.date.accessioned2021-10-20T17:19:45Z
dc.date.available2021-10-20T17:19:45Z
dc.date.issued2012-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21656
dc.rights.oaversionhttps://lirias.kuleuven.be/1736015&lang=en
dc.title

Modelling and experimental evaluation of (post) lithography process contributions to pattern roughness

dc.typePHD thesis
dspace.entity.typePublication
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